IT Industry Today: Low-k Dielectric News http://it.einnews.com/news/low-kConstantly updated news and information about it industry. A New "Direct Low-k/Cu Dual-Damascene Contact lines" is developed first time in the world for Leading-edge LSI, boosting up performance of CMOS devices by lowering the contact resistance and the parasitic capacitance especially fo http://it.einnews.com/news.php?wid=186616284 5 Sep 2008 04:25 GMT ... capacitance to the conventional ones. Durable double-layered low-k structure is implemented by using our original ... (SiO , k=4.1), was implemented to pre-metal dielectric (PMD) film. Here, narrow-pitched gaps of CMOS ...